Chromium Aluminum(CrAl) Target is a cutting-edge product offered by Zhejiang Huita Optoelectronic Material Co.ltd. As a leading manufacturer and exporter in China, we take pride in presenting this high-quality product to our esteemed B2B buyers in the electronic semiconductor industry. The CrAl target is designed to be used in magnetron sputtering processes, making it an indispensable component for various applications in this field.

Our Chromium Aluminum(CrAl) Target comes with top-tier specifications to meet the demanding requirements of our users. It is made from a combination of chromium and aluminum (Cr+Al) and is available in different sizes, such as Dia.127 x 11mm. The composition of Cr:Al can be tailored to 70/30 at%; 95/15 or as per customer specifications. With densities and refractive indices meeting industry standards, our product is reliable and ensures optimal performance.

The CrAl target comes in a round tube form, offering ease of use and installation in semiconductor coating processes. At Huita Optoelectronic Material Co.ltd, we maintain exceptional purity levels for our products, with options of 3N and 3N5 purity grades. This guarantees efficient and consistent results in electronic semiconductor applications.

Application-wise, the Chromium Aluminum(CrAl) Target proves its worth in electronic semiconductor industry coating and magnetron sputtering. Its exceptional properties make it ideal for use in these crucial processes, contributing to enhanced performance and reliability of electronic devices and components.

Product name : Chromium Aluminum(CrAl) Target
Product No. : 202191695449
Material : Cr+Al
Size : Dia.127 x 11mm; Cr:Al 70/30 at%; 95/15 or according to customer requirements
Density(g/cm3) :
Refractive Index :
Form : Round, Tube
Purity : 3N, 3N5
Application : Electronic semiconductor industry coating, magnetron sputtering