Cathodic Arc PVD Coater
Cathodic Arc PVD Coater adopts a method of arc discharging to evaporate directly metal from solid cathode targets and the evaporated material is ions from cathode substance released from the cathode arc glow, thereby deposit films on the surface of the substrate.
Cathodic Arc Deposition is a widely used industrial-scale process for applying high quality thin film coatings. The process is based on low-voltage, high current cathodic arc physics that produce a dense, highly ionized plasma. Cathodic Arc Deposition is characterized by a nearly 100% ionized deposition plasma with relatively high-energy deposition ions.
There are a number of advantages to the higher ion energies associated with Cathodic Arc Deposition. For example, Cathodic Arc Deposition films tend to be denser and have better adhesion characteristics than films produced using other methods. The deposited atoms penetrate the surface, locking the coating to the surface with high adhesion.